The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2022
Filed:
Jun. 09, 2020
Korea Institute of Science and Technology, Seoul, KR;
Joon Seok Lee, Seoul, KR;
In Ae Lee, Seoul, KR;
Hui Jin Jung, Seoul, KR;
Seok Lee, Seoul, KR;
Deok Ha Woo, Seoul, KR;
KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY, Seoul, KR;
Abstract
The present invention relates to a mesoporous film structure having ultra-large pores therein and a method of manufacturing the same, which includes, The manufacturing method includes a pretreatment step of pretreating a support so that micelles and silica are deposited on the support, a micelle formation step of mixing a cationic surfactant and an anionic co-surfactant for forming the micelles at a predetermined ratio in a support-carried water tank prepared in the pretreatment step, followed by heating, thus forming enlarged micelles on the support through magnetic bonding of the cationic surfactant and the anionic co-surfactant, a silica deposition step of supplying a silica precursor solution to the water tank, followed by heating, thus depositing silica on the support after the micelle formation step, and a washing step of washing the support so that residual materials (containing the micelles) are removed after the silica deposition step.