The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 2022

Filed:

Mar. 12, 2020
Applicant:

Formlabs, Inc., Somerville, MA (US);

Inventors:

Andrew M. Goldman, Stow, MA (US);

Henry Whitney, Weymoth, MA (US);

Justin Keenan, Lexington, MA (US);

Benjamin FrantzDale, Harvard, MA (US);

Michael Fogleman, Cary, NC (US);

Dmitri Megretski, Carlisle, MA (US);

Assignee:

Formlabs, Inc., Somerville, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/386 (2017.01); B33Y 50/00 (2015.01); G05B 19/4099 (2006.01); B29C 64/135 (2017.01);
U.S. Cl.
CPC ...
B29C 64/386 (2017.08); B29C 64/135 (2017.08); B33Y 50/00 (2014.12); G05B 19/4099 (2013.01); G05B 2219/49023 (2013.01);
Abstract

According to some aspects, techniques are provided to more accurately produce fine features in additive fabrication. According to some embodiments, the techniques comprise a process that amplifies exposure to edges and thin positive features whilst not substantially affecting negative features. In particular, an area to be cured may be adapted using signal processing techniques to produce an energy density map. The area may subsequently be cured according to the generated energy density map by, for example, adjusting the scan speed, light power and/or number of passes of the light beam according to the map. As a result, the net exposure to edges and thin positive features may be amplified.


Find Patent Forward Citations

Loading…