The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2022
Filed:
Feb. 28, 2019
Paris Sciences ET Lettres-quartier Latin, Paris, FR;
Centre National DE LA Recherche Scientifique (Cnrs), Paris, FR;
Sorbonne Universite, Paris, FR;
Ecole Nationale Superieure DE Chimie DE Paris, Paris, FR;
Julien Wengler, Paris, FR;
Stéphanie Ognier, Paris, FR;
Safwan Al Ayoubi, Wattignies, FR;
Michael Tatoulian, Paris, FR;
Paris Sciences et Lettres, Paris, FR;
Centre National de la Recherche Scientifique (CNRS), Paris, FR;
Sorbonne Universite, Paris, FR;
Ecole Nationale Supérieure de Chimie de Paris, Paris, FR;
Abstract
The present invention relates to a plasma reactor and more specifically to an plasma microreactor comprising a support, made at least partially of a dielectric material, the support comprising a gas inlet, a liquid inlet, at least a fluid outlet, a liquid microchannel in the support, a gas channel, at least a ground electrode, at least a high voltage electrode, separated from the gas channel by the dielectric material of the support, wherein said ground electrode and said high voltage electrode are arranged on opposite sides of the gas channel so as to be able to create an electric field inside the gas channel, wherein the liquid microchannel and the gas channel are contiguous and at least an opening is arranged between the liquid microchannel and the gas channel so as to form a fluid channel and to cause the liquid flow contact the gas flow and wherein the liquid flow is retained within the liquid microchannel by capillarity action.