The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2022
Filed:
Mar. 16, 2018
Applicant:
University of Massachusetts, Boston, MA (US);
Inventors:
James J. Watkins, South Hadley, MA (US);
Wenhao Li, Sunderland, MA (US);
Assignee:
University of Massachusetts, Boston, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/04 (2006.01); G03F 7/00 (2006.01); H01M 4/131 (2010.01); H01M 4/1391 (2010.01); H01M 4/36 (2006.01); H01M 4/505 (2010.01); H01M 4/62 (2006.01); H01M 10/0525 (2010.01); H01M 10/058 (2010.01);
U.S. Cl.
CPC ...
H01M 4/0433 (2013.01); G03F 7/0002 (2013.01); H01M 4/0404 (2013.01); H01M 4/0471 (2013.01); H01M 4/131 (2013.01); H01M 4/1391 (2013.01); H01M 4/366 (2013.01); H01M 4/505 (2013.01); H01M 4/622 (2013.01); H01M 10/058 (2013.01); H01M 10/0525 (2013.01);
Abstract
Various embodiments disclosed relate to novel methods of fabricating 3-D Li ion batteries using direct nanoimprint lithography. The present invention includes methods of fabricating high surface area electrodes, including imprint patterning of high aspect ratio parallel grating style electrodes. The method includes coating a substrate with an ink containing nanoparticles and subsequently annealing the ink into a desired pattern.