The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2022

Filed:

Feb. 12, 2020
Applicant:

Stmicroelectronics (Crolles 2) Sas, Crolles, FR;

Inventor:

Francois Roy, Seyssins, FR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/113 (2006.01); H01L 31/0224 (2006.01); H01L 27/146 (2006.01);
U.S. Cl.
CPC ...
H01L 31/1136 (2013.01); H01L 27/1463 (2013.01); H01L 27/14605 (2013.01); H01L 27/14614 (2013.01); H01L 27/14643 (2013.01); H01L 31/022408 (2013.01); H01L 31/022475 (2013.01); H01L 27/1464 (2013.01);
Abstract

A semiconductor layer is doped with a first doping type and has an upper surface. A first electrode insulated from the semiconductor layer extending through the semiconductor layer from the upper surface. A second electrode insulated from the semiconductor layer extends through the semiconductor layer from the upper surface. The first and second electrodes are biased by a voltage to produce an electrostatic field within the semiconductor layer causing the formation of a depletion region. The depletion region responds to absorption of a photon with an avalanche multiplication that produces charges that are collected at first and second oppositely doped regions within the semiconductor substrate.


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