The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2022

Filed:

Nov. 07, 2017
Applicant:

Sony Semiconductor Solutions Corporation, Kanagawa, JP;

Inventor:

Koichi Takeuchi, Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/146 (2006.01); H01L 27/142 (2014.01); H04N 5/341 (2011.01); H04N 5/369 (2011.01); G02B 1/115 (2015.01); H01L 21/027 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H01L 27/14603 (2013.01); G02B 1/115 (2013.01); G03F 7/20 (2013.01); H01L 21/027 (2013.01); H01L 27/142 (2013.01); H01L 27/146 (2013.01); H01L 27/14629 (2013.01); H04N 5/341 (2013.01); H04N 5/369 (2013.01);
Abstract

A substrate includes a photoelectric converting unit in a pixel unit and a reflection ratio adjusting layer provided on the substrate in an incident direction of incident light with respect to the substrate for adjusting reflection of the incident light on the substrate. The reflection ratio adjusting layer includes a first layer formed on the substrate and a second layer formed on the first layer, the first layer has an uneven structure provided on the substrate, and a recess portion on the uneven structure is filled with a material having a lower refractive index than that of the substrate forming the second layer, and a thickness of the first layer is optimized for a wavelength of light to be received. The present technology may be applied to an imaging device.


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