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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11387132 B1

PDFFull Text
Date of Patent:
Jul. 12, 2022

Filed:

Jan. 27, 2017

Ceramic material and electrostatic chuck device

Applicant:

Sumitomo Osaka Cement Co., Ltd., Tokyo, JP;

Inventors:

Yoshiki Yoshioka, Tokyo, JP;

Nobuhiro Hidaka, Tokyo, JP;

Hironori Kugimoto, Tokyo, JP;

Assignee:

SUMITOMO OSAKA CEMENT CO., LTD., Tokyo, JP;

Attorney:

Merchant & Gould P.C.

Primary Examiner:

Karl E Group

Assistant Examiner:

Cameron K Miller

Int. Cl.
CPC ...
H01L 21/683 (2006.01); C04B 35/117 (2006.01); C04B 35/626 (2006.01); C04B 35/645 (2006.01); H01J 37/32 (2006.01); B25J 19/00 (2006.01); B25J 15/00 (2006.01); H01L 21/687 (2006.01); B25J 9/00 (2006.01); B25J 11/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6833 (2013.01); B25J 9/0012 (2013.01); B25J 11/0095 (2013.01); B25J 15/0085 (2013.01); B25J 19/0054 (2013.01); C04B 35/117 (2013.01); C04B 35/6261 (2013.01); C04B 35/6264 (2013.01); C04B 35/62655 (2013.01); C04B 35/645 (2013.01); H01J 37/32 (2013.01); H01J 37/3255 (2013.01); H01J 37/32477 (2013.01); H01J 37/32697 (2013.01); H01J 37/32715 (2013.01); H01L 21/6831 (2013.01); H01L 21/68757 (2013.01); C04B 2235/00 (2013.01); C04B 2235/3217 (2013.01); C04B 2235/3826 (2013.01); C04B 2235/3834 (2013.01); C04B 2235/40 (2013.01); C04B 2235/5445 (2013.01); C04B 2235/5454 (2013.01); C04B 2235/606 (2013.01); C04B 2235/6562 (2013.01); C04B 2235/661 (2013.01); C04B 2235/781 (2013.01); C04B 2235/85 (2013.01); C04B 2235/87 (2013.01); H01J 2237/0041 (2013.01);
Abstract

Provided is a composite sintered body for an electrostatic chuck, which is not easily broken even if it is exposed to high-power plasma. Further, provided are an electrostatic chuck device using such a composite sintered body for an electrostatic chuck and a method of manufacturing a composite sintered body for an electrostatic chuck. The composite sintered body for an electrostatic chuck is a composite sintered body including an insulating ceramic and silicon carbide, in which crystal grains of the silicon carbide are dispersed in at least one selected from the group consisting of a crystal grain boundary and a crystal grain of a main phase formed by sintering crystal grains of the insulating ceramic.

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