The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2022

Filed:

May. 18, 2020
Applicant:

Thermo Fisher Scientific (Bremen) Gmbh, Bremen, DE;

Inventors:

Alexander A. Makarov, Bremen, DE;

Wilko Balschun, Bremen, DE;

Jan-Peter Hauschild, Weyhe, DE;

Denis Chernyshev, Bremen, DE;

Eduard V. Denisov, Bremen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/06 (2006.01); H01J 49/00 (2006.01); H01J 49/42 (2006.01);
U.S. Cl.
CPC ...
H01J 49/063 (2013.01); H01J 49/0045 (2013.01); H01J 49/068 (2013.01); H01J 49/4215 (2013.01); H01J 49/4225 (2013.01);
Abstract

The present invention provides an electrode arrangement' for an ion trap, ion filter, an ion guide, a reaction cell or an ion analyser. The electrode arrangement′ comprises an RF electrode′ mechanically coupled to a dielectric material. The RF electrode′ is mechanically coupled to the dielectric materialby a plurality of separatorsthat are spaced apart and configured to define a gap between the RF electrode′ and the dielectric material. Each of the plurality of separatorscomprises a projecting portionand the dielectric materialcomprises corresponding receiving portionssuch that on coupling of the RF electrode′ to the dielectric material, the projecting portionof each separatoris received within the corresponding receiving portionof the dielectric material. The present invention also relates to an ion trap comprises the electrode arrangement′ and a method of manufacturing the electrode arrangement


Find Patent Forward Citations

Loading…