The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2022
Filed:
Mar. 18, 2020
Fujifilm Corporation, Tokyo, JP;
Yasuhiko Kaneko, Tokyo, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided are a training data creation method and device, and a defect inspection method and device capable of securing the accuracy of defect inspection even though the number of samples of a defect to be used in creating training data is small. The training data creation method includes acquiring a training-use image including a received light image created based on reflected light or transmitted light from an inspection object having a defect obtained by irradiating the inspection object with light rays or radiation, executing frequency distribution analysis on the training-use image, receiving an input of a parameter for designating a frequency bandwidth, selecting a frequency bandwidth signal from an analysis result of the frequency distribution analysis according to the frequency bandwidth designated by the parameter, acquiring defect information indicating a defect for an image corresponding to the frequency bandwidth signal, and creating training data to be used in learning of a defect inspection device, which inspects a defect of the inspection object, based on the defect information.