The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2022
Filed:
Jun. 09, 2015
Atomic layer deposition chamber with funnel-shaped gas dispersion channel and gas distribution plate
Applied Materials, Inc., Santa Clara, CA (US);
Muhammad M. Rasheed, San Jose, CA (US);
Srinivas Gandikota, Santa Clara, CA (US);
Mario Dan Sanchez, San Jose, CA (US);
Guoqiang Jian, San Jose, CA (US);
Yixiong Yang, Santa Clara, CA (US);
Deepak Jadhav, Hubli, IN;
Ashutosh Agarwal, Rajasthan, IN;
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Methods and apparatus for processing a substrate are provided herein. In some embodiments, a substrate processing chamber includes: a chamber body; a chamber lid assembly having a housing enclosing a central channel that extends along a central axis and has an upper portion and a lower portion; a lid plate coupled to the housing and having a contoured bottom surface that extends downwardly and outwardly from a central opening coupled to the lower portion of the central channel to a peripheral portion of the lid plate; and a gas distribution plate disposed below the lid plate and having a plurality of apertures disposed through the gas distribution plate.