The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2022
Filed:
Feb. 14, 2019
The Government of the United States of America, As Represented BY the Secretary of the Navy, Arlington, VA (US);
Xiao Liu, Fairfax, VA (US);
Battogtokh Jugdersuren, Alexandria, VA (US);
Matthew R. Abernathy, Washington, DC (US);
Thomas H. Metcalf, Washington, DC (US);
Abstract
A method for producing a sputtered stoichiometric a-AlOthin film. A substrate is placed into a chamber containing an Al target to be sputtered. The chamber is evacuated to a base pressure of about 7×10Torr or lower and the temperature of the substrate is maintained. With a sputtering shutter in the chamber closed, Ar gas is flowed into the chamber to backsputter the Al target and Ar and Ogases are flowed into the chamber to presputter the target. The shutter is opened and Al is sputtered onto the substrate in the presence of the Ar and Ogases to obtain a sputtered a-AlOfilm on the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile