The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2022
Filed:
Aug. 31, 2018
Sekisui Chemical Co., Ltd., Osaka, JP;
Yu Nagahara, Kyoto, JP;
Yoshishige Takikawa, Osaka, JP;
Takaya Oshita, Nagareyama, JP;
Tsuyoshi Uehara, Nara, JP;
SEKISUI CHEMICAL CO., LTD., Osaka, JP;
Abstract
The present invention provides a reactive gas application apparatus capable of easily and surely applying a reactive gas to a target object. The reactive gas application apparatus () includes: a plasma generating unit (), a nozzle () for discharging a reactive gas activated by plasma generated in the plasma generation unit (), and a light source unit () for emitting light toward a position ahead of a tip of the nozzle (). The reactive gas application apparatus preferably further includes a control unit for synchronizing plasma generation in the plasma generation unit and light emission in the light source unit.