The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2022
Filed:
Apr. 25, 2020
Samsung Electronics Co., Ltd., Suwon-si, KR;
Hyunchul Yoon, Seongnam-si, KR;
Mincheol Kwak, Hwaseong-si, KR;
Joonghee Kim, Anyang-si, KR;
Jihee Kim, Yongin-si, KR;
Yeongshin Park, Seoul, KR;
Jungheun Hwang, Daejeon, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
In order to manufacture an integrated circuit device, a feature layer is formed on a substrate in a first area for forming a plurality of chips and in a second area surrounding the first area. The feature layer has a step difference in the second area. On the feature layer, a hard mask structure including a plurality of hard mask layers stacked on each other is formed. In the first area and the second area, a protective layer covering the hard mask structure is formed. On the protective layer, a photoresist layer is formed. A photoresist pattern is formed by exposing and developing the photoresist layer in the first area by using the step difference in the second area as an alignment key.