The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2022

Filed:

Dec. 24, 2019
Applicant:

Dai Nippon Printing Co., Ltd., Tokyo, JP;

Inventors:

Masato Ushikusa, Tokyo, JP;

Yusuke Nakamura, Tokyo, JP;

Hideyuki Okamoto, Tokyo, JP;

Yoshinori Murata, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/033 (2006.01); H01L 51/50 (2006.01); H05B 33/10 (2006.01); C23C 14/04 (2006.01); C23C 14/24 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0337 (2013.01); C23C 14/04 (2013.01); C23C 14/24 (2013.01); H01L 21/0332 (2013.01); H01L 51/001 (2013.01); H01L 51/0011 (2013.01); H01L 51/50 (2013.01); H05B 33/10 (2013.01); C23C 14/042 (2013.01);
Abstract

A deposition mask includes: a first mask having an opening formed therein; and a second mask superposed on the first mask and having a plurality of through-holes formed therein, the through-hole having a planar dimension smaller than a planar dimension of the opening; wherein: the deposition mask has a plurality of joints that join the second mask and the first mask to each other; the plurality of joints are arranged along an outer edge of the second mask; and a notch is formed at a position in the outer edge of the second mask, the position corresponding to a space between the adjacent two joints.


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