logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11380546 B1

PDFFull Text
Date of Patent:
Jul. 05, 2022

Filed:

Dec. 24, 2019

Deposition mask, deposition mask apparatus, manufacturing method of deposition mask, and manufacturing method of deposition mask apparatus

Applicant:

Dai Nippon Printing Co., Ltd., Tokyo, JP;

Inventors:

Masato Ushikusa, Tokyo, JP;

Yusuke Nakamura, Tokyo, JP;

Hideyuki Okamoto, Tokyo, JP;

Yoshinori Murata, Tokyo, JP;

Assignee:

Dai Nippon Printing Co., Ltd., Tokyo, JP;

Attorney:

Burr & Brown, PLLC

Primary Examiner:

Jiong-Ping Lu

Int. Cl.
CPC ...
H01L 21/033 (2006.01); H01L 51/50 (2006.01); H05B 33/10 (2006.01); C23C 14/04 (2006.01); C23C 14/24 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0337 (2013.01); C23C 14/04 (2013.01); C23C 14/24 (2013.01); H01L 21/0332 (2013.01); H01L 51/001 (2013.01); H01L 51/0011 (2013.01); H01L 51/50 (2013.01); H05B 33/10 (2013.01); C23C 14/042 (2013.01);
Abstract

A deposition mask includes: a first mask having an opening formed therein; and a second mask superposed on the first mask and having a plurality of through-holes formed therein, the through-hole having a planar dimension smaller than a planar dimension of the opening; wherein: the deposition mask has a plurality of joints that join the second mask and the first mask to each other; the plurality of joints are arranged along an outer edge of the second mask; and a notch is formed at a position in the outer edge of the second mask, the position corresponding to a space between the adjacent two joints.

Find Patent Forward Citations

Ushikusa, Masato. (2022). Deposition mask, deposition mask apparatus, manufacturing method of deposition mask, and manufacturing method of deposition mask apparatus (U.S. Patent No. 11380546). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11380546

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…