The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2022
Filed:
Mar. 22, 2021
Applicant:
Google Llc, Mountain View, CA (US);
Inventors:
Brian James Burkett, Santa Barbara, CA (US);
Rami Barends, Goleta, CA (US);
Assignee:
Google LLC, Mountain View, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 1/36 (2012.01); G03F 1/70 (2012.01); G03F 1/76 (2012.01);
U.S. Cl.
CPC ...
G03F 7/70425 (2013.01); G03F 1/36 (2013.01); G03F 1/70 (2013.01); G03F 1/76 (2013.01);
Abstract
A method of fabricating a circuit element, such as a quantum computing circuit element, including obtaining a lithography mask write file that includes mask information characterizing one or more mask features, obtaining a uniformity function that is configured to modify the mask information to compensate for a non-uniform deposition process, applying the uniformity function to the lithography mask write to obtain a modified lithography mask write file, and performing lithography as directed by the modified lithography mask write file.