The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2022
Filed:
Apr. 10, 2019
Applicants:
Basf SE, Ludwigshafen am Rhein, DE;
Wayne State University, Detroit, MI (US);
Inventors:
Charles Hartger Winter, Detroit, MI (US);
Kyle Blakeney, Detroit, MI (US);
Lukas Mayr, Ludwigshafen, DE;
David Dominique Schweinfurth, Ludwigshafen, DE;
Sabine Weiguny, Ludwigshafen, DE;
Daniel Waldmann, Ludwigshafen, DE;
Assignees:
BASF SE, Ludwigshafen am Rhein, DE;
Wayne State University, Detroit, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 5/06 (2006.01); C23C 16/30 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C07F 5/067 (2013.01); C23C 16/30 (2013.01); C23C 16/45553 (2013.01);
Abstract
The present disclosure is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. Described herein is a process for preparing metal-containing films including: