The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2022

Filed:

Nov. 09, 2021
Applicant:

Chi Chen Hsien, Sacramento, CA (US);

Inventor:

Chi Chen Hsien, Sacramento, CA (US);

Assignee:

Other;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A41D 13/11 (2006.01); A41D 31/30 (2019.01); A62B 23/02 (2006.01);
U.S. Cl.
CPC ...
A41D 13/1192 (2013.01); A41D 31/305 (2019.02); A62B 23/025 (2013.01); A41D 2500/30 (2013.01);
Abstract

Apparatuses of electrochemical antimicrobial face masks and methods for manufacturing the same are provided. In one embodiment, an electrochemical antimicrobial face mask may include an electrochemical antimicrobial section configured to inactivate microbes that are in contact with the electrochemical antimicrobial section, and a filtration section configured to provide additional protection that prevents a user from breathing in the microbes, and where the electrochemical antimicrobial section is attached to the filtration section. The electrochemical antimicrobial section may include a galvanic corrosion cell membrane configured to generate antimicrobial agents via a galvanic electrochemical reaction, a hydrophilic antimicrobial membrane configured to inactivate microbes using the antimicrobial agents, and a regeneration pad configured to supply materials to the galvanic corrosion cell membrane for generating the antimicrobial agents.


Find Patent Forward Citations

Loading…