The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2022
Filed:
Dec. 21, 2010
Applicants:
Stephen Forrest, Ann Arbor, MI (US);
Richard Lunt, Ann Arbor, MI (US);
Inventors:
Stephen Forrest, Ann Arbor, MI (US);
Richard Lunt, Ann Arbor, MI (US);
Assignees:
The Regents of the University of Michigan, Ann Arbor, MI (US);
The Trustees of Princeton University, Princeton, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/12 (2006.01); C23C 16/455 (2006.01); C23C 16/44 (2006.01); C23C 14/24 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0008 (2013.01); C23C 14/12 (2013.01); C23C 14/24 (2013.01); C23C 16/4412 (2013.01); C23C 16/4551 (2013.01); C23C 16/45561 (2013.01); C23C 16/45563 (2013.01); C23C 16/45574 (2013.01);
Abstract
Methods and systems for organic vapor jet deposition are provided, where an exhaust is disposed between adjacent nozzles. The exhaust may reduce pressure buildup in the nozzles and between the nozzles and the substrate, leading to improved deposition profiles, resolution, and improved nozzle-to-nozzle uniformity. The exhaust may be in fluid communication with an ambient vacuum, or may be directly connected to a vacuum source.