The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 28, 2022

Filed:

Oct. 26, 2020
Applicant:

Fuji Electric Co., Ltd., Kanagawa, JP;

Inventors:

Yasunori Agata, Matsumoto, JP;

Takahiro Tamura, Matsumoto, JP;

Toru Ajiki, Matsumoto, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/00 (2006.01); H01L 21/22 (2006.01); H01L 21/265 (2006.01); H01L 27/06 (2006.01); H01L 29/32 (2006.01); H01L 29/739 (2006.01); H01L 29/861 (2006.01); H01L 29/36 (2006.01);
U.S. Cl.
CPC ...
H01L 21/221 (2013.01); H01L 21/26526 (2013.01); H01L 27/0664 (2013.01); H01L 29/32 (2013.01); H01L 29/36 (2013.01); H01L 29/7397 (2013.01); H01L 29/8613 (2013.01);
Abstract

A semiconductor device comprising a semiconductor substrate is provided, wherein the semiconductor substrate has a hydrogen containing region that contains hydrogen, the hydrogen containing region contains helium in at least some region, a hydrogen chemical concentration distribution of the hydrogen containing region in a depth direction has one or more hydrogen concentration trough portions, and in each of the hydrogen concentration trough portions the hydrogen chemical concentration is equal to or higher than 1/10 of an oxygen chemical concentration. In at least one of the hydrogen concentration trough portions, the hydrogen chemical concentration may be equal to or higher than a helium chemical concentration.


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