The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2022
Filed:
Jul. 14, 2020
Beijing Normal University, Beijing, CN;
Guangdong Guangxin Ion Beam Technology Co., Ltd., Guangzhou, CN;
Bin Liao, Beijing, CN;
Xiao Ouyang, Beijing, CN;
Guoliang Wang, Beijing, CN;
Xiaoping Ouyang, Beijing, CN;
Jun Luo, Beijing, CN;
Pan Pang, Beijing, CN;
Lin Chen, Beijing, CN;
Xu Zhang, Beijing, CN;
Xianying Wu, Beijing, CN;
Minju Ying, Beijing, CN;
Beijing Normal University, Beijing, CN;
GUANGXIN ION BEAM TECHNOLOGY CO., LTD., Guangdong, CN;
Abstract
The disclosure provides a metal ion source emitting device comprising a ceramic chamber, a leading-out electrode chamber and three cathodes hermetically connected, a trigger electrode fixed on a ceramic insulating element, a cathode target material fixed on an indirect cooling channel, a limiting element fixed on a fixed element, the fixed element fixing the indirect cooling channel on a cathode cooling pipe, the cathode cooling pipe fixed on a cathode flange, a trigger binding post connected with the trigger electrode, a leading-out electrode and an accelerating electrode arranged right below a cathode in the leading-out electrode chamber, and leading-out slits formed on the accelerating electrode and the leading-out electrode. According to the emitting device, three cathodes can operate simultaneously with only one anode, increasing irradiation area of an ion source, and improving the operating efficiency and energy utilization rate, with a more compact emitting source and larger processing area.