The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 28, 2022

Filed:

Sep. 05, 2019
Applicant:

Baidu Online Network Technology (Beijing) Co., Ltd., Beijing, CN;

Inventors:

Xun Zhou, Beijing, CN;

Yuanfan Xie, Beijing, CN;

Shirui Li, Beijing, CN;

Liang Wang, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01S 13/931 (2020.01); G01S 13/89 (2006.01); G01S 13/933 (2020.01); G05D 1/02 (2020.01); G06T 7/70 (2017.01); G01S 13/00 (2006.01);
U.S. Cl.
CPC ...
G01S 13/931 (2013.01); G01S 13/89 (2013.01); G01S 13/933 (2020.01); G05D 1/024 (2013.01); G05D 1/0257 (2013.01); G06T 7/70 (2017.01);
Abstract

Embodiments of the present disclosure disclose a method and an apparatus for determining a relative pose, a device, and a medium. The method comprises: obtaining millimeter-wave data for obstacles in a scene collected by a millimeter-wave radar sensor in a vehicle and first data for the obstacles in the scene collected by a first sensor in the vehicle, wherein, at least one millimeter-wave radar signal booster is disposed in the scene as a target obstacle and the obstacles comprise the target obstacle; determining first obstacle data for the target obstacle in a millimeter-wave radar coordinate system and second obstacle data for the target obstacle in a first sensor coordinate system according to the millimeter-wave data and the first data for the obstacles in the scene; and determining the relative pose between the millimeter-wave radar sensor and the first sensor according to the first obstacle data and the second obstacle data.


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