The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2022
Filed:
Dec. 14, 2011
Steven Edward Coe, Ascot, GB;
Jonathan James Wilman, Ascot, GB;
Daniel James Twitchen, Ascot, GB;
Geoffrey Alan Scarsbrook, Ascot, GB;
John Robert Brandon, Ascot, GB;
Christopher John Howard Wort, Ascot, GB;
Steven Edward Coe, Ascot, GB;
Jonathan James Wilman, Ascot, GB;
Daniel James Twitchen, Ascot, GB;
Geoffrey Alan Scarsbrook, Ascot, GB;
John Robert Brandon, Ascot, GB;
Christopher John Howard Wort, Ascot, GB;
Element Six Technologies Limited, Didcot, GB;
Abstract
A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor includes a plasma chamber, a substrate holder, a microwave coupling configuration for feeding microwaves into the plasma chamber, and a gas flow system for feeding process gases into the plasma chamber and removing them therefrom. The gas flow system includes a gas inlet array having a plurality of gas inlets for directing the process gases towards the substrate holder. The gas inlet array includes at least six gas inlets disposed in a substantially parallel or divergent orientation relative to a central axis of the plasma chamber.