The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2022
Filed:
Feb. 15, 2017
Applicant:
Tsinghua University, Beijing, CN;
Inventors:
Ting Zhu, Beijing, CN;
Lei Liu, Beijing, CN;
Weiliang Xu, Beijing, CN;
Zimou Wang, Beijing, CN;
Wenjun Jiang, Beijing, CN;
Jiaxing Wang, Beijing, CN;
Linping Yu, Beijing, CN;
Assignee:
Tsinghua University, Beijing, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12N 9/12 (2006.01); C12N 15/10 (2006.01);
U.S. Cl.
CPC ...
C12N 9/1252 (2013.01); C12N 15/10 (2013.01); C12N 15/1068 (2013.01); C12Y 207/07007 (2013.01);
Abstract
Provided is a method for replicating a mirror nucleic acid, comprising: reacting a mirror nucleic acid template, a mirror nucleic acid primer and mirror dNTPs/rNTPs in the presence of a mirror nucleic acid polymerase, so as to obtain the mirror nucleic acid.