The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2022
Filed:
Nov. 03, 2020
Applicant:
Soulbrain Co., Ltd., Gyeonggi-do, KR;
Inventors:
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/06 (2006.01); H01L 21/02 (2006.01); H01L 29/66 (2006.01); H01L 27/11556 (2017.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
C09K 13/06 (2013.01); H01L 21/0214 (2013.01); H01L 21/02458 (2013.01); H01L 21/31111 (2013.01); H01L 27/11556 (2013.01); H01L 29/6684 (2013.01); H01L 29/66825 (2013.01);
Abstract
The disclosure is related to a composition for etching, a method for manufacturing the composition, and a method for fabricating a semiconductor using the same. The composition may include a first inorganic acid, at least one of silane inorganic acid salts produced by reaction between a second inorganic acid and a silane compound, and a solvent. The second inorganic acid may be at least one selected from the group consisting of a sulfuric acid, a fuming sulfuric acid, a nitric acid, a phosphoric acid, and a combination thereof.