The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 28, 2022

Filed:

Jul. 19, 2021
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Tomohiro Watanabe, Niigata, JP;

Takeshi Kinsho, Niigata, JP;

Yusuke Nagae, Niigata, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 67/293 (2006.01); C07C 67/327 (2006.01);
U.S. Cl.
CPC ...
C07C 67/327 (2013.01); C07C 67/293 (2013.01);
Abstract

The present invention provides processes for preparing an α-necrodyl compound of the following general formula (3): wherein Rrepresents a monovalent hydrocarbon group having 1 to 9 carbon atoms, the process comprising: subjecting a 3, 5, 5-trimethyl-3-cyclopentene compound of the following general formula (1): wherein Ris as defined above, and X represents a leaving group, to a nucleophilic substitution reaction with a methylating agent of the following general formula (2): wherein M represents Li, MgZ, ZnZ, Cu, CuZ, or CuLiZ, and Zrepresents a halogen atom or a methyl group, to form the α-necrodyl compound (3). The present invention further provides processes for preparing γ-necrodyl compounds of the following general formula (4): wherein Rrepresents a monovalent hydrocarbon group having 1 to 9 carbon atoms, the process comprising: subjecting the α-necrodyl compound (3) thus obtained to a positional isomerization reaction at the double bond to form the γ-necrodyl compound (4).


Find Patent Forward Citations

Watanabe, Tomohiro. (2022). Processes for preparing alpha-necrodyl compounds and processes for preparing gamma-necrodyl compounds (U.S. Patent No. 11370741). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11370741

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