The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2022
Filed:
Apr. 14, 2021
Chongqing Institute of East China Normal University, Chongqing, CN;
Roi Optoelectronics Technology Co, Ltd., Shanghai, CN;
East China Normal University, Shanghai, CN;
Heping Zeng, Chongqing, CN;
Junyi Nan, Chongqing, CN;
Mengyun Hu, Chongqing, CN;
Ming Yan, Chongqing, CN;
CHONGQING INSTITUTE OF EAST CHINA NORMAL UNIVERSITY, Chongqing, CN;
ROI OPTOELECTRONICS TECHNOLOGY CO, LTD., Shanghai, CN;
EAST CHINA NORMAL UNIVERSITY, Shanghai, CN;
Abstract
The present disclosure discloses a method and apparatus for manufacturing a microfluidic chip with a femtosecond plasma grating. The method is characterized in that two or more beams of femtosecond pulse laser act on quartz glass together at a certain included angle and converge in the quartz glass, and when pulses achieve synchronization in time domain, the two optical pulses interfere; Benefited by constraint of an interference field, only one optical filament is formed in one interference period; and numbers of optical filaments are arranged equidistantly in space to form the plasma grating. The apparatus for manufacturing the microfluidic chip includes a plasma grating optical path, a microchannel processing platform, and a hydrofluoric acid ultrasonic cell.