The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 21, 2022

Filed:

Mar. 27, 2020
Applicant:

Lapis Semiconductor Co., Ltd., Kanagawa, JP;

Inventor:

Noriyuki Miura, Miyagi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 5/369 (2011.01); H01L 27/146 (2006.01);
U.S. Cl.
CPC ...
H04N 5/369 (2013.01); H01L 27/1463 (2013.01); H01L 27/14692 (2013.01);
Abstract

A method of manufacturing a semiconductor device and a method of manufacturing a solid-state imaging device, including preparing an SOI wafer in which a silicon layer is disposed on an FZ wafer that is a silicon wafer manufactured according to an FZ method, with an insulation layer being interposed between the silicon layer and the FZ wafer, removing a part of the silicon layer, as an element isolation region, to form a trench for division of the silicon layer, and forming plural circuit elements that each include at least a part of the silicon layer other than the element isolation region, and which are isolated from each other by the element isolation region.


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