The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 21, 2022

Filed:

Aug. 21, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Hariklia Deligianni, Alpine, NJ (US);

Bruce B. Doris, Slingerlands, NY (US);

Eugene J. O'Sullivan, Nyack, NY (US);

Naigang Wang, Ossining, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01F 41/02 (2006.01); H01F 17/00 (2006.01); H01F 27/245 (2006.01);
U.S. Cl.
CPC ...
H01F 41/02 (2013.01); H01F 17/0013 (2013.01); H01F 27/245 (2013.01); H01F 2017/0066 (2013.01);
Abstract

Embodiments of the invention are directed to a method of fabricating a yoke arrangement of an inductor. A non-limiting example method includes forming a dielectric layer across from a major surface of a substrate. The method further includes configuring the dielectric layer such that it imparts a predetermined dielectric layer compressive stress on the substrate. A magnetic stack is formed on an opposite side of the dielectric layer from the substrate, wherein the magnetic stack includes one or more magnetic layers alternating with one or more insulating layers. The method further includes configuring the magnetic stack such that it imparts a predetermined magnetic stack tensile stress on the dielectric layer, wherein a net effect of the predetermined dielectric layer compressive stress and the predetermined magnetic stack tensile stress on the substrate is insufficient to cause a portion of the major surface of the substrate to be substantially non-planar.


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