The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2022
Filed:
Jun. 17, 2021
Applicant:
Nextvpu (Shanghai) Co., Ltd., Shanghai, CN;
Inventors:
Linfeng Li, Shanghai, CN;
Haijiao Cai, Shanghai, CN;
Xinpeng Feng, Shanghai, CN;
Ji Zhou, Shanghai, CN;
Assignee:
NEXTVPU (SHANGHAI) CO., LTD., Shanghai, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06V 40/00 (2022.01); G06V 30/412 (2022.01); G06F 40/174 (2020.01); G06F 40/106 (2020.01); G06T 7/11 (2017.01); G06V 30/414 (2022.01); G06V 30/416 (2022.01); G06V 30/418 (2022.01);
U.S. Cl.
CPC ...
G06V 30/412 (2022.01); G06F 40/106 (2020.01); G06F 40/174 (2020.01); G06T 7/11 (2017.01); G06V 30/414 (2022.01); G06V 30/416 (2022.01); G06V 30/418 (2022.01); G06V 2201/131 (2022.01);
Abstract
A layout analysis method, an electronic device, and a non-transitory computer-readable storage medium are provided. The layout analysis method includes: obtaining coordinate information of a plurality of text lines in an image; creating a layout model of the image according to the coordinate information; analyzing a layout structure of the text lines based on the layout model; and determining an order of the text lines relative to each other based on the layout structure.