The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 21, 2022

Filed:

Oct. 15, 2020
Applicant:

Convergent R.n.r Ltd., Tirat Carmel, IL;

Inventors:

Aharon Bar-David, Nesher, IL;

Michael Kleckner, Ramat-Ishai, IL;

Shirly Borukhin, Atlit, IL;

Zeev Burshtein, Nes-Ziona, IL;

Avigail Keller, Haifa, IL;

Zeev Harel, Kfar-Saba, IL;

Assignee:

CONVERGENT R.N.R LTD., Tirat Carmel, IL;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61N 5/10 (2006.01);
U.S. Cl.
CPC ...
A61N 5/1031 (2013.01); A61N 5/1048 (2013.01); A61N 5/1077 (2013.01);
Abstract

A method of evaluating a maximal dose deposited by a non-uniform X-ray beam within a medium comprising the steps of: (a) irradiating said medium by said non-uniform X-ray beam penetrating into a depth of said medium along an axis of said X-ray beam; (b) incrementally measuring a number of transversal dose distributions at successive depths along said axis; (c) determining a maximum dose within each of said number of transversal dose distributions; and (d) calculating a 1-Dimensional depth dependence of said maximal doses obtained from said number of transversal dose distributions.


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