The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 14, 2022

Filed:

Sep. 04, 2019
Applicant:

Ngk Insulators, Ltd., Nagoya, JP;

Inventors:

Risako Ito, Nagoya, JP;

Makoto Ohmori, Nagoya, JP;

Hirofumi Kan, Nagoya, JP;

Yuki Tanaka, Nagoya, JP;

Masayuki Shinkai, Aichi, JP;

Assignee:

NGK INSULATORS, LTD., Nagoya, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01M 8/0265 (2016.01); H01M 8/2485 (2016.01); H01M 8/2483 (2016.01); H01M 8/2428 (2016.01); H01M 8/2484 (2016.01); H01M 8/1226 (2016.01); H01M 8/12 (2016.01);
U.S. Cl.
CPC ...
H01M 8/0265 (2013.01); H01M 8/2428 (2016.02); H01M 8/2483 (2016.02); H01M 8/2484 (2016.02); H01M 8/2485 (2013.01); H01M 8/1226 (2013.01); H01M 2008/1293 (2013.01);
Abstract

A cell stack device includes a manifold and a fuel cell. The manifold includes a gas supply chamber and a gas collection chamber. The fuel cell includes a support substrate and a power generation element portion. The support substrate includes first and second gas channels. The first gas channel is connected to the gas supply chamber, and the second gas channel is connected to the gas collection chamber. The first gas channel is open in the gas supply chamber at a proximal end portion. The second gas channel is open in the gas collection chamber at a proximal end portion. The first and second gas channels are connected to each other on the distal end portion side. The first and second gas channels are configured such that a pressure loss of gas in the first gas channel is smaller than a pressure loss of gas in the second gas channel.


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