The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2022
Filed:
Jan. 29, 2018
Baidu Usa Llc, Sunnyvale, CA (US);
Dong Li, Sunnyvale, CA (US);
Liangliang Zhang, Sunnyvale, CA (US);
Yajia Zhang, Sunnyvale, CA (US);
Yifei Jiang, Sunnyvale, CA (US);
Haoyang Fan, Sunnyvale, CA (US);
Jiangtao Hu, Sunnyvale, CA (US);
BAIDU USA LLC, Sunnyvale, CA (US);
Abstract
Via a first processing thread, an ADV is controlled according to a first trajectory that was generated based on a first reference line starting at a first location. Concurrently via a second processing thread, a second reference line is generated based on a second location of the first trajectory that the ADV will likely reach within a predetermined period of time in future. The predetermined period of time is greater than or equals to an amount of time to generate a reference line for the ADV. The second reference line is generated while the ADV is moving according to the first trajectory and before reaching the second location. Subsequently, in response to determining that the ADV is within a predetermined proximity of the second location, a second trajectory is generated based on the second reference line without having to calculate the second reference line at the second location.