The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 14, 2022

Filed:

Dec. 02, 2019
Applicant:

United States of America As Represented BY the Administrator of Nasa, Washington, DC (US);

Inventors:

Tyler B Hudson, Suffolk, VA (US);

Frank L. Palmieri, Yorktown, VA (US);

Trenton B. Abbott, Henderson, NC (US);

Jeffrey P. Seebo, Newport News, VA (US);

Eric R. Burke, Yorktown, VA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 29/02 (2006.01); B29C 35/02 (2006.01); G01N 29/24 (2006.01); G01N 29/44 (2006.01); G01N 29/11 (2006.01); G01N 29/09 (2006.01);
U.S. Cl.
CPC ...
G01N 29/09 (2013.01); B29C 35/0288 (2013.01); G01N 29/02 (2013.01); G01N 29/11 (2013.01); G01N 29/24 (2013.01); G01N 29/44 (2013.01);
Abstract

Non-destructive evaluation (NDE) systems and methods are provided for monitoring objects being manufactured during a cure or consolidation process and for detecting defects that occur during the cure or consolidation process or to detect conditions of the process that can lead to the occurrence of defects. Information acquired by the NDE system during the cure or consolidation process can be used to adjust one or more parameters of the process in real-time to prevent defects from occurring or to reduce the number and/or severity of defects that occur during the cure or consolidation process.


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