The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2022
Filed:
Jan. 26, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Shuaidi Zhang, Santa Clara, CA (US);
Ning Li, San Jose, CA (US);
Mihaela Balseanu, Sunnyvale, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/06 (2006.01); C23C 16/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4554 (2013.01); C23C 16/0227 (2013.01); C23C 16/06 (2013.01); C23C 16/4583 (2013.01);
Abstract
Methods of selectively forming SiCON films are described. In some embodiments, the methods comprise sequential exposure to a silicon halide, a mixture of alkanolamine and amine reactants and a deposition plasma. In some embodiments, the method further comprises pre-cleaning the target substrate to improve selectivity.