The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 14, 2022

Filed:

May. 31, 2018
Applicant:

Central Glass Company, Limited, Ube, JP;

Inventors:

Masakiyo Nagatomo, Ube, JP;

Akifumi Yao, Ube, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); B08B 5/00 (2006.01); B08B 7/00 (2006.01); B08B 7/04 (2006.01); B08B 9/08 (2006.01); C01G 39/04 (2006.01); C01G 41/04 (2006.01); C23C 16/30 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); B08B 5/00 (2013.01); B08B 7/0071 (2013.01); B08B 7/04 (2013.01); B08B 9/08 (2013.01); C01G 39/04 (2013.01); C01G 41/04 (2013.01); C23C 16/30 (2013.01);
Abstract

A treatment method according to the present invention includes bringing a metal oxyfluoride of the general formula: MOF(where 0<x<6; and M=W or Mo) into contact with a fluorine-containing gas at a reaction temperature higher than or equal to 0° C. and lower than 400° C., thereby converting the metal oxyfluoride to a metal hexafluoride of the general formula: MF(where M=W or Mo). This treatment method enables conversion of the metal oxyfluoride to the high vapor pressure compound without the use of a plasma generator and can be applied to cleaning of a metal fluoride production apparatus or cleaning of a film forming apparatus.


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