The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2022

Filed:

Aug. 23, 2019
Applicant:

Massachusetts Institute of Technology, Cambridge, MA (US);

Inventors:

Jeehwan Kim, Cambridge, MA (US);

Wei Kong, Cambridge, MA (US);

Jaewoo Shim, Cambridge, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/78 (2006.01); H01L 21/02 (2006.01); H01L 21/04 (2006.01); H01L 21/285 (2006.01); H01L 21/443 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/7806 (2013.01); H01L 21/0259 (2013.01); H01L 21/02458 (2013.01); H01L 21/02527 (2013.01); H01L 21/02568 (2013.01); H01L 21/043 (2013.01); H01L 21/28575 (2013.01); H01L 21/443 (2013.01); H01L 29/66742 (2013.01); H01L 29/66969 (2013.01);
Abstract

Embodiments of this disclosure include apparatus, systems, and methods for fabricating monolayers. In one example, a method includes forming a multilayer film having a plurality of monolayers of a two-dimensional (2D) material on a growth substrate. The multilayer film has a first side proximate the growth substrate and a second side opposite the first side.


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