The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2022

Filed:

Aug. 12, 2021
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Hideyuki Nishikawa, Kanagawa, JP;

Ryoji Goto, Kanagawa, JP;

Yuuta Fujino, Kanagawa, JP;

Mirei Arayasu, Kanagawa, JP;

Yuki Nakamura, Kanagawa, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/13363 (2006.01); G02F 1/1335 (2006.01); C09K 19/38 (2006.01); G02F 1/1337 (2006.01);
U.S. Cl.
CPC ...
G02F 1/13363 (2013.01); C09K 19/3809 (2013.01); G02F 1/133541 (2021.01); G02F 1/133711 (2013.01); G02F 2201/083 (2013.01); G02F 2202/02 (2013.01);
Abstract

Provided is an optically anisotropic film exhibiting reverse wavelength dispersibility with excellent thickness-direction phase differences, a laminate, a circularly polarizing plate, and a display device. The optically anisotropic film of an embodiment of the present invention satisfies the following Requirements 1 to 4. Requirement 1: In a case of irradiation with P-polarized light and S-polarized light, which are linearly polarized light perpendicular to each other, from a direction inclined by 45° from a normal direction of a film surface of the optically anisotropic film, an absorption intensity ratio in a case of irradiation with S-polarized light to an absorption intensity in a case of irradiation with P-polarized light is 1.02 or more in an absorption intensity at a wavelength having a largest absorption in a wavelength range of 700 to 900 nm. Requirement 2: Re(550)<10 nm, Requirement 3: Re(800)<10 nm. Requirement 4: Rth(450)/Rth(550)<1.


Find Patent Forward Citations

Loading…