The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2022

Filed:

Aug. 18, 2020
Applicant:

Ascend Performance Materials Operations Llc, Houston, TX (US);

Inventors:

Wai-shing Yung, Pensacola, FL (US);

Harrie Schoots, League City, TX (US);

Rahim Jindani, Houston, TX (US);

Victor G. Kholodkov, Pensacola, FL (US);

Jeffrey L. Walker, Cantonment, FL (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/60 (2006.01);
U.S. Cl.
CPC ...
G01N 27/60 (2013.01);
Abstract

A method for measuring the attraction propensity of fabric including the steps of charging a neutralized test fabric, optionally by contacting with a charging fabric, presenting the charged test fabric a predetermined distance from a static-influenced agent such that at least a portion of the static-influenced agent attaches to the charged test fabric, and determining the quantity of attached static-influenced agent.


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Quick Actions:

Yung, Wai-shing. (2022). Method for measuring static attraction propensity (U.S. Patent No. 11353425). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11353425

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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