The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2022
Filed:
Feb. 26, 2021
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventor:
William Dean Thompson, Pleasanton, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 5/00 (2022.01); H04N 5/33 (2006.01); G01J 5/48 (2022.01);
U.S. Cl.
CPC ...
G01J 5/0007 (2013.01); H04N 5/33 (2013.01); G01J 5/48 (2013.01); G01J 2005/0077 (2013.01);
Abstract
IR radiation may be used to examine substrates prior to a fabrication operation in order to adjust processing parameters of the fabrication operation, or to determine features of the substrate. A thermographic image may be collected and provided to a transfer function or machine learning model to determine processing parameters or features. The processing parameters may improve the uniformity of the wafer and/or achieve a desired target feature value.