The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2022

Filed:

Dec. 11, 2017
Applicant:

Avantium Knowledge Centre B.v., Amsterdam, NL;

Inventors:

Benjamin McKay, Amsterdam, NL;

Johannes Hendrick Vleeming, Breda, NL;

Wei Zhao, Breda, NL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 7/07 (2006.01); C01B 7/01 (2006.01); C07H 1/00 (2006.01);
U.S. Cl.
CPC ...
C01B 7/0712 (2013.01); C01B 7/01 (2013.01); C07H 1/00 (2013.01);
Abstract

A purified hydrochloric acid composition is prepared from a stream of a contaminated hydrochloric acid composition by a process comprising a distillation treatment, wherein at least a first distillation column is operated at a first pressure and a second distillation column is operated at a second pressure, which second pressure is lower than the first pressure; wherein the contaminated hydrochloric acid composition comprises water, contaminants and hydrochloric acid in a first hydrochloric acid concentration of above the azeotropic composition of hydrochloric acid and water at the first pressure; wherein a part of the stream of the contaminated hydrochloric acid composition is fed into the first distillation column to yield a first bottom product comprising water and hydrochloric acid with a hydrochloric acid concentration below the first hydrochloric acid concentration and a first top product comprising hydrochloric acid in a concentration above the azeotropic hydrochloric acid composition at the first pressure; wherein at least a portion of the first bottom product is passed to the second distillation column; wherein another part of the stream of the contaminated hydrochloric acid composition is fed into the second distillation column to yield a second top product comprising contaminants and water, and a second bottom product comprising water and hydrochloric acid; wherein at least a part of the second bottom product is recycled into the first distillation column; and wherein the first top product is recovered as purified hydrochloric acid composition.


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