The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2022

Filed:

Jul. 02, 2018
Applicants:

Nippon Sheet Glass Company, Limited, Tokyo, JP;

National Institute of Advanced Industrial Science and Technology, Tokyo, JP;

Inventors:

Takashi Fukuzawa, Tokyo, JP;

Hidenori Nagai, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01L 7/00 (2006.01); B01L 3/02 (2006.01); B01L 3/00 (2006.01); C12Q 1/6806 (2018.01); C12Q 1/686 (2018.01); G01N 21/78 (2006.01); C12N 15/09 (2006.01); C12M 1/00 (2006.01); C12Q 1/68 (2018.01);
U.S. Cl.
CPC ...
B01L 7/52 (2013.01); B01L 3/0289 (2013.01); B01L 3/50273 (2013.01); B01L 3/502746 (2013.01); B01L 7/525 (2013.01); C12M 1/00 (2013.01); C12N 15/09 (2013.01); C12Q 1/6806 (2013.01); G01N 21/78 (2013.01); B01L 3/502715 (2013.01); B01L 2200/026 (2013.01); B01L 2200/0684 (2013.01); B01L 2200/0694 (2013.01); B01L 2200/10 (2013.01); B01L 2300/0816 (2013.01); B01L 2300/0883 (2013.01); B01L 2300/14 (2013.01); B01L 2400/0481 (2013.01); B01L 2400/0487 (2013.01); C12Q 1/68 (2013.01); C12Q 1/686 (2013.01);
Abstract

A reaction processor includes: a reaction processing vessel placing portion for placing a reaction processing vessel provided with a channel into which a sample is introduced; a temperature control system, which controls the temperature of the channel in order to heat the sample inside the channel; and a liquid feeding system, which controls the pressure inside the channel of the reaction processing vessel in order to move the sample inside the channel. The liquid feeding system maintains the pressure inside the channel to be higher than the atmospheric pressure in the surrounding of the reaction processing vessel, more preferably 1 atm or higher, during a reaction process of the sample.


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