The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2022

Filed:

Feb. 07, 2020
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Tetsuya Kamimura, Haibara-gun, JP;

Masahiro Yoshidome, Haibara-gun, JP;

Yukihisa Kawada, Haibara-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 61/02 (2006.01); B01D 71/32 (2006.01); B01D 65/10 (2006.01);
U.S. Cl.
CPC ...
B01D 61/022 (2013.01); B01D 65/10 (2013.01); B01D 71/32 (2013.01); B01D 2221/14 (2013.01); B01D 2311/14 (2013.01); B01D 2311/2623 (2013.01); B01D 2317/02 (2013.01); B01D 2317/04 (2013.01); B01D 2317/08 (2013.01); B01D 2325/02 (2013.01); B01D 2325/42 (2013.01);
Abstract

An object of the present invention is to provide a chemical liquid purification method which makes it possible to obtain a chemical liquid having excellent defect inhibition performance. The chemical liquid purification method according to an embodiment of the present invention is a chemical liquid purification method including obtaining a chemical liquid by filtering a substance to be purified containing an organic solvent by using two or more kinds of filters having different pore sizes, in which a supply pressure Pof the substance to be purified supplied to a filter Fhaving a maximum pore size Xamong the two or more kinds of filters and a supply pressure Pof the substance to be purified supplied to a filter Fhaving a minimum pore size Xamong the two or more kinds of filters satisfy P>P.


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