The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2022
Filed:
Mar. 05, 2020
Dalian University of Technology, Liaoning, CN;
Xin Fan, Liaoning, CN;
Risheng Liu, Liaoning, CN;
Zhuoxiao Li, Liaoning, CN;
Wei Zhong, Liaoning, CN;
Zhongxuan Luo, Liaoning, CN;
DALIAN UNIVERSITY OF TECHNOLOGY, Liaoning, CN;
Abstract
The present invention discloses a disparity image stitching and visualization method based on multiple pairs of binocular cameras. A calibration algorithm is used to solve the positional relationship between binocular cameras, and the prior information is used to solve a homography matrix between images; internal parameters and external parameters of the cameras are used to perform camera coordinate system transformation of depth images; the graph cut algorithm has high time complexity and depends on the number of nodes in a graph; the present invention divides the images into layers, and solutions are obtained layer by layer and iterated; then the homography matrix is used to perform image coordinate system transformation of the depth images, and a stitching seam is synthesized to realize seamless panoramic depth image stitching; and finally, depth information of a disparity image is superimposed on a visible light image.