The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 2022

Filed:

Feb. 23, 2021
Applicant:

Octoml, Inc., Seattle, WA (US);

Inventors:

Matthew Welsh, Seattle, WA (US);

Jason Knight, San Diego, CA (US);

Jared Roesch, Seattle, WA (US);

Thierry Moreau, Seattle, WA (US);

Adelbert Chang, Cupertino, CA (US);

Tianqi Chen, Pittsburgh, PA (US);

Luis Henrique Ceze, Seattle, WA (US);

An Wang, Seattle, WA (US);

Michal Piszczek, Seattle, WA (US);

Andrew McHarg, Kirkland, WA (US);

Fletcher Haynes, Redmond, WA (US);

Assignee:

OctoML, Inc., Seattle, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 20/00 (2019.01);
U.S. Cl.
CPC ...
G06N 20/00 (2019.01);
Abstract

A facility for optimizing machine learning models is described. The facility obtains a description of a machine learning model and a hardware target for the machine learning model. The facility obtains optimization result data from a repository of optimization result data. The facility optimizes the machine learning model for the hardware target based on the optimization result data.


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