The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2022
Filed:
Oct. 01, 2019
Seiko Epson Corporation, Tokyo, JP;
Yoshitomo Kumai, Okaya, JP;
SEIKO EPSON CORPORATION, Tokyo, JP;
Abstract
In a process of manufacturing a polarizing element, in a first film forming step, a metal film, a light absorption film, a hard mask, and a resist mask are sequentially formed, and then, in a patterning step, the metal film and the light absorption film are patterned to form a protruded portion provided with a light absorbing portion at a surface side of a metal portion. In a first etching step, dry etching is performed, with the light absorbing portion being an etching mask, to narrow a width of the metal portion. In a second film forming step, a silicon oxide film is formed to cover the protruded portion. In a second etching step, the dry etching is performed on the silicon oxide film, using the light absorbing portion as an etching mask, to leave the silicon oxide film at a side surface of the metal portion.