The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 2022

Filed:

Nov. 12, 2019
Applicant:

Tcl China Star Optoelectronics Technology Co., Ltd., Shenzhen, CN;

Inventors:

Yuanyang Ma, Shenzhen, CN;

Miao Zhou, Shenzhen, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/201 (2013.01); G03F 7/0007 (2013.01); G03F 7/0035 (2013.01);
Abstract

A method of manufacturing a color filter and a color filter are provided. The method includes steps of manufacturing a color resist layer and an inorganic barrier layer on a base substrate. The step of manufacturing the color resist layer includes sequentially forming a first color resist, a second color resist, and a third color resist, and the first color resist, the second color resist, and the third color resist are repeatedly arranged in order in a direction along a surface of the base substrate. The step of manufacturing the inorganic barrier layer includes forming a first inorganic barrier layer covering the first color resist after the first coloder resist is formed and before the second color resist is formed. By setting the inorganic barrier layer to separate different color resists, it is possible to avoid diffusion pollution between different color resists and ensure a display performance.


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