The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2022
Filed:
May. 24, 2018
Samsung Electronics Co., Ltd., Suwon-si, KR;
Byung Sun Park, Suwon-si, KR;
Ji Youn Seo, Seoul, KR;
Ji Woon Im, Hwaseong-si, KR;
Hyun Seok Lim, Suwon-si, KR;
Byung Ho Chun, Seongnam-si, KR;
Yu Seon Kang, Hwaseong-si, KR;
Hyuk Ho Kwon, Hwaseong-si, KR;
Sung Jin Park, Seongnam-si, KR;
Tae Yong Eom, Anyang-si, KR;
Dong Hyeop Ha, Daegu, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A deposition apparatus includes an upper shower head and a lower shower head within a process chamber, the upper shower head and the lower shower head facing each other, a support structure between the upper shower head and the lower shower head, the support structure being connected to the lower shower head to support a wafer, and a plasma process region between the wafer supported by the support structure and the lower shower head, wherein the lower shower head includes lower holes to jet a lower gas in a direction of the wafer, wherein the upper shower head includes upper holes to jet an upper gas in a direction of the wafer, and wherein the support structure includes through opening portions to discharge a portion of the lower gas jetted through the lower holes to a space between the support structure and the upper shower head.