The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2022
Filed:
Jun. 18, 2019
Applicant:
Avava, Inc., Waltham, MA (US);
Inventors:
Irina Erenburg, Milton, MA (US);
Jayant Bhawalkar, Auburndale, MA (US);
Charles Holland Dresser, Wayland, MA (US);
Joseph Ting, Acton, MA (US);
Assignee:
Avava, Inc., Waltham, MA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 18/00 (2006.01); A61B 18/04 (2006.01); A61K 41/00 (2020.01); A61N 1/44 (2006.01); A61N 5/06 (2006.01); A61N 5/067 (2006.01);
U.S. Cl.
CPC ...
A61B 18/04 (2013.01); A61K 41/0028 (2013.01); A61K 41/0052 (2013.01); A61N 5/062 (2013.01); A61B 2018/00577 (2013.01); A61N 1/44 (2013.01); A61N 5/067 (2021.08); A61N 2005/0626 (2013.01);
Abstract
A method includes depositing within a predetermined region of a target tissue with a plurality of dopant particles. The method also includes focusing a laser beam to a focal region that overlaps with at least a portion of the predetermined region. The focal region includes at least a first dopant particle of the plurality of dopant particles. The method further includes adjusting a first parameter of the laser beam to generate plasma within a plasma volume comprising the first dopant particle.