The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2022

Filed:

May. 23, 2019
Applicant:

Universal Display Corporation, Ewing, NJ (US);

Inventors:

Lichang Zeng, Lawrenceville, NJ (US);

Chuanjun Xia, Lawrenceville, NJ (US);

Scott Joseph, Ewing, NJ (US);

Walter Yeager, Yardley, PA (US);

Mingjuan Su, Ewing, NJ (US);

Ting-Chih Wang, Lawrenceville, NJ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); C09K 11/06 (2006.01); H01L 51/50 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0067 (2013.01); C09K 11/06 (2013.01); H01L 51/5016 (2013.01); H01L 51/5056 (2013.01); H01L 51/5096 (2013.01); H01L 2251/55 (2013.01); H01L 2251/556 (2013.01);
Abstract

A premixed co-evaporation source that is a mixture of a first compound and a second compound is disclosed. The co-evaporation source is for vacuum deposition process. The first compound has a different chemical structure than the second compound. The first compound and the second compound are both organic compounds. At least one of the first compound and the second compound contains at least one less abundant stable isotope atom. At least one of the first compound and the second compound is a fluorescent or delayed fluorescent emitter. The first compound has an evaporation temperature T1 of 100 to 400° C.; the second compound has an evaporation temperature T2 of 100 to 400° C.; the absolute value of T1−T2 is less than 20° C. The first compound has a concentration C1 in said mixture and a concentration C2 in a film formed by evaporating the mixture in a high vacuum deposition tool with a chamber base pressure between 1×10Torr to 1×10Torr, at a 2 Å/sec deposition rate on a surface positioned at a predefined distance away from the mixture being evaporated. The absolute value of (C1−C2)/C1 is less than 5%.


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