The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2022

Filed:

Sep. 03, 2020
Applicant:

National Chiao Tung University, Hsinchu, TW;

Inventors:

Bing-Yue Tsui, Hsinchu, TW;

Fang-Hsin Lu, Taoyuan, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 29/423 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1095 (2013.01); H01L 21/0273 (2013.01); H01L 29/4236 (2013.01); H01L 29/66734 (2013.01); H01L 29/7813 (2013.01);
Abstract

A structure of trench transistors includes the following elements. A substrate serves as a drain of the structure of trench transistors. An epitaxial layer is disposed on the substrate. A plurality of trenches are disposed in the epitaxial layer. A plurality of gate insulator layers are respectively disposed on the inner surfaces of the trenches. A plurality of gates are respectively disposed on the gate insulator layers. A plurality of first base regions are respectively disposed in the epitaxial layer between the adjacent trenches, and have a first depth from the top surface of the epitaxial layer. A plurality of second base regions are respectively disposed in the epitaxial layer adjacent to the sidewalls of the trenches, and each has a second depth from the bottom surface of the first base region. A plurality of sources are respectively disposed in the first base region beside the sidewalls of the trenches.


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